বিশেষ উল্লেখ

Imprint Techniques: Supports both thermal and UV nanoimprint lithography, allowing for versatile patterning processes.

Imprint Pressure: Capable of applying pressures ranging from 0.3 bar to 11 bar, accommodating a wide array of imprinting requirements.

Temperature Control: Features precise temperature control, essential for thermal NIL processes.

Substrate Compatibility: Accommodates substrates up to 4 inches (100 mm) in diameter, with a total height capacity of up to 20 mm. An extension ring is available to support substrates up to 45 mm in height.

Stamp and Substrate Materials: Compatible with various materials, including polymers like mr-I series, SU8, and Topas, as well as substrates such as silicon and glass.

User Interface: Designed for ease of use, featuring an intuitive interface that simplifies operation without the need for dedicated operating staff.

Size and Portability: Compact design with an imprint chamber size of 12 x 14 x 16 cm and control modules measuring 40 x 25 x 9.5 cm each, facilitating easy integration into laboratory settings. Warranty: 4 Years